4.5 (308) · $ 23.50 · In stock
Effect of 3 nm gate length scaling in junctionless double
Anil VOHRA, Professor (Full), M.Sc., Ph.D
Modelled and experimental Hall voltage response in vertical Hall
Subband profile along the device length (left), and current
I-V curves for Non-graded base SiGe HBT
Modelled and experimental Hall voltage response in vertical Hall
IG vs VGS curves with various metal gates for Si with and without
Schematic of the real-space representation of an electron device
Photo-generation Rate generated in the model.
Effect of 3 nm gate length scaling in junctionless double